Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Milana C. Vasudev, Hilmar Koerner, Kristi M. Singh, Benjamin P. Partlow, David L. Kaplan, Ehud Gazit, Timothy J. Bunning, Rajesh R. Naik

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

Original languageEnglish
Pages (from-to)533-540
Number of pages8
JournalBiomacromolecules
Volume15
Issue number2
DOIs
StatePublished - 10 Feb 2014

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