Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Milana C. Vasudev; Hilmar Koerner; Kristi M. Singh; Benjamin P. Partlow; David L. Kaplan; Ehud Gazit; Timothy J. Bunning; Rajesh R. Naik

doi:10.1021/bm401491k

Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Milana C. Vasudev, Hilmar Koerner, Kristi M. Singh, Benjamin P. Partlow, David L. Kaplan, Ehud Gazit, Timothy J. Bunning, Rajesh R. Naik^*

^*Corresponding author for this work

Biotechnology

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

Original language	English
Pages (from-to)	533-540
Number of pages	8
Journal	Biomacromolecules
Volume	15
Issue number	2
DOIs	https://doi.org/10.1021/bm401491k
State	Published - 10 Feb 2014

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abstract = "In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.",

author = "Vasudev, {Milana C.} and Hilmar Koerner and Singh, {Kristi M.} and Partlow, {Benjamin P.} and Kaplan, {David L.} and Ehud Gazit and Bunning, {Timothy J.} and Naik, {Rajesh R.}",

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AU - Vasudev, Milana C.

AU - Koerner, Hilmar

AU - Singh, Kristi M.

AU - Partlow, Benjamin P.

AU - Kaplan, David L.

AU - Gazit, Ehud

AU - Bunning, Timothy J.

AU - Naik, Rajesh R.

PY - 2014/2/10

Y1 - 2014/2/10

N2 - In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

AB - In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

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Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

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