Vacuum arc deposition: Early history and recent developments

Vacuum arc deposition (VAD) was first investigated at the end of the 19^th Century by A.W. Wright and T.A. Edison as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing. VAD has become an established industrial art for producing hard, wear-resistant and decorative coatings. Sophisticated coatings, including tertiary compounds and multi-layers, are increasingly used. Filtered vacuum arc deposition and hot electrode vacuum arcs are increasingly investigated to obtain high-quality, macroparticle-free films. Improved filtered sources, including large rectangular filters, have been demonstrated. Besides tool coatings, films for metallizing integrated circuits and protecting magnetic media are being developed.