Two-dimensional localization in thin copper films

L. Van Den dries*, C. Van Haesendonck, Y. Bruynseraede, G. Deutscher

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Resistance measurements have been made on low-resistivity thin Cu films (50-500) between 1 and 20 K. A logarithmic temperature dependence of the resistance is observed. For a resistance per square of R<20 Ω/□, good agreement is obtained with the localization theory. The amplitude of the resistance variation and its large magnetic-field dependence exclude possible Coulomb-interaction effects predicted by Altshuler et al. as the main source of the observed behavior.

Original languageEnglish
Pages (from-to)565-568
Number of pages4
JournalPhysical Review Letters
Issue number8
StatePublished - 1981


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