TY - JOUR
T1 - Trapping effects on AlGaN/GaN HEMT characteristics
AU - Vigneshwara Raja, P.
AU - Nallatamby, Jean Christophe
AU - DasGupta, Nandita
AU - DasGupta, Amitava
N1 - Publisher Copyright:
© 2020 Elsevier Ltd
PY - 2021/2
Y1 - 2021/2
N2 - This paper describes device simulation studies of surface and buffer trapping effects on static I-V, output-admittance (Y22), and transient characteristics of AlGaN/GaN HEMTs. The TCAD simulation model considering surface donors at EC − 0.5 eV and buffer traps at EC − 0.47 eV have been used to quantitatively reproduce the measured DC, Y22 frequency dispersion, gate-lag (GL) and drain-lag (DL) transients of AlGaN/GaN HEMT with 0.25 µm gate length. Moreover, simulated GL and DL transient responses of AlGaN/GaN HEMT with a longer gate length (0.5 µm) are validated with the reported experimental results. The impact of barrier trap at EC − 0.45 eV on the HEMT properties is also explored. It is shown that by matching simulation results with experimental data, it is possible to identify the trap (surface or buffer) responsible for a particular trapping induced degradation as well as its concentration and capture cross-section.
AB - This paper describes device simulation studies of surface and buffer trapping effects on static I-V, output-admittance (Y22), and transient characteristics of AlGaN/GaN HEMTs. The TCAD simulation model considering surface donors at EC − 0.5 eV and buffer traps at EC − 0.47 eV have been used to quantitatively reproduce the measured DC, Y22 frequency dispersion, gate-lag (GL) and drain-lag (DL) transients of AlGaN/GaN HEMT with 0.25 µm gate length. Moreover, simulated GL and DL transient responses of AlGaN/GaN HEMT with a longer gate length (0.5 µm) are validated with the reported experimental results. The impact of barrier trap at EC − 0.45 eV on the HEMT properties is also explored. It is shown that by matching simulation results with experimental data, it is possible to identify the trap (surface or buffer) responsible for a particular trapping induced degradation as well as its concentration and capture cross-section.
KW - Buffer trap
KW - Current dispersion
KW - GaN HEMT
KW - Output admittance
KW - Surface donor
KW - TCAD simulation
UR - http://www.scopus.com/inward/record.url?scp=85099703923&partnerID=8YFLogxK
U2 - 10.1016/j.sse.2020.107929
DO - 10.1016/j.sse.2020.107929
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AN - SCOPUS:85099703923
SN - 0038-1101
VL - 176
JO - Solid-State Electronics
JF - Solid-State Electronics
M1 - 107929
ER -