Keyphrases
Silicon Nitride
100%
Spectroscopic Techniques
100%
Ultrathin Films
100%
Emission Spectroscopy
100%
Trap Spectroscopy
100%
Exoelectron Emission
100%
Thermally Stimulated Exoelectron Emission
100%
Activation Energy
50%
Low Temperature
25%
High Temperature
25%
Hole Trapping
25%
Retention Properties
25%
Deep Traps
25%
Cell Memory
25%
Maximum Temperature
25%
Electron Holes
25%
Ultrathin
25%
Measurement Method
25%
Temperature Peak
25%
Material Degradation
25%
Silicon Nitride Film
25%
Memory Transistors
25%
Temperature Spectra
25%
Chemistry
Exoelectron Emission
100%
Ultrathin Film
100%
Emission Spectroscopy
80%
Silicon
40%
Hydrogen
40%
Liquid Film
40%
Reaction Activation Energy
40%
Nitride
40%
Deep Trap
20%
Hole Trap
20%
Material Degradation Process
20%
Measurement Method
20%
Material Science
Silicon Nitride
100%
Ultrathin Films
100%
Emission Spectroscopy
100%
Film
50%
Activation Energy
50%
Transistor
25%
Materials Degradation
25%
Physics
Activation Energy
100%
Silicon Nitride
100%
Holes (Electron Deficiencies)
50%
Measurement Method
50%
Materials Degradation
50%
Engineering
Nitride
100%
Activation Energy
100%
Low-Temperature
50%
Materials Degradation
50%