Transverse magnetoresistance behaviors of thin polycrystalline bismuth films

Rachel Rosenbaum*, J. Galibert

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The magnetoresistance (MR) properties of several thin polycrystalline bismuth films have been measured over a wide temperature interval (0.42 K ≤ T ≤ 292 K) and a magnetic field range (0T ≤ B ≤ 45T). In most cases, the magnetic field was oriented in the transverse direction, with the field parallel to the substrate of the film and also perpendicular to the current direction. These MR results are different from those in either the perpendicular or parallel field orientations. The anomalous behavior of the transverse magnetoresistance can be explained considering partially diffused scattering of the carriers at the top and bottom surfaces of the films. The data are fitted using a phenomenological model, based upon the theory of Way and Kao and also using the two carrier expressions of Pippard and Fawcett (P-F).

Original languageEnglish
Pages (from-to)1077-1092
Number of pages16
JournalJournal of Low Temperature Physics
Volume138
Issue number5-6
DOIs
StatePublished - Mar 2005

Funding

FundersFunder number
National Science Foundation

    Keywords

    • Bismuth
    • Electronic transport
    • Polycrystalline thin films
    • Transverse magnetoresistance

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