Thin Zr Film Deposition Using a Refractory Anode Vacuum Arc Plasma Source

Isak I. Beilis, D. Arbilly, Yefim Yankelevich, Raymond L. Boxman

Research output: Contribution to journalArticlepeer-review

Abstract

Thin Zr films were deposited using a vacuum arc with a refractory graphite anode and a water-cooled Zr cathode. The deposition rate was obtained from the film thickness, measured by profilometry, and time of exposure to the arc plasma. The deposition rate increased with the arc current, gap distance, and arcing time before substrate exposure to Zr plasma. The measured deposition rate reached 0.9 <inline-formula> <tex-math notation="LaTeX">$\mu$</tex-math> </inline-formula>m/min for an arc current of 225 A for time before substrate exposure of 90 s and the rate tends to about 1 <inline-formula> <tex-math notation="LaTeX">$\mu$</tex-math> </inline-formula>m/min with further this time.

Original languageEnglish
Pages (from-to)1-5
Number of pages5
JournalIEEE Transactions on Plasma Science
DOIs
StateAccepted/In press - 2022

Keywords

  • Anodes
  • Cathodes
  • Deposition
  • Plasma temperature
  • Plasmas
  • Substrates
  • Vacuum arcs
  • Zirconium
  • metallic plasma
  • refractory anode
  • thin film
  • vacuum arc
  • zirconium

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