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Thickness profiles of SiO2 films deposited from tetraethoxysilane/O3 precursors in ultra-high-aspect-ratio capillaries
R. J. Soave*, S. Ganguli, W. N. Gill, Y. Shacham-Diamand, J. W. Mayer
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
Scopus
citations