Thickness profiles of SiO2 films deposited from tetraethoxysilane/O3 precursors in ultra-high-aspect-ratio capillaries

R. J. Soave*, S. Ganguli, W. N. Gill, Y. Shacham-Diamand, J. W. Mayer

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Thickness profiles of SiO2 films deposited from tetraethoxysilane/O3 precursors in ultra-high-aspect-ratio capillaries'. Together they form a unique fingerprint.

Physics & Astronomy