Thickness profiles of SiO2 films deposited from tetraethoxysilane/O3 precursors in ultra-high-aspect-ratio capillaries

  • R. J. Soave*
  • , S. Ganguli
  • , W. N. Gill
  • , Y. Shacham-Diamand
  • , J. W. Mayer
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

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Keyphrases

Engineering

Material Science

Chemical Engineering