Thick (up to 100 μm) CoNiFe soft magnetic films were electrodeposited for micro-system technology application. The solid composition was characterized and compared to the bath composition and the deposition conditions. The samples obtained were either single or two-phased depending primarily on the Fe concentration; the highest attained Bs was of about 20 kG. It was shown that film resistivity of 50 μΩ cm can be reached by adding molybdenum salts to the bath. The films were deposited either on blanket wafers or on pre-defined photoresist patterned wafers. The resultant island structure was used to define small magnetic components.
- CoNiFe alloys
- High B thick film