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The effect of tungsten and boron on the Cu barrier and oxidation properties of thin electroless cobalt-tungsten-boron films

  • Hila Einati*
  • , Vadim Bogush
  • , Yelena Sverdlov
  • , Yuri Rosenberg
  • , Yosi Shacham-Diamand
    • *Corresponding author for this work
  • Tel Aviv University
  • Belarusian State University of Informatics and Radioelectronics
  • Waseda University

Research output: Contribution to journal › Article › peer-review

52 Scopus citations

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