Abstract
Two copper disks were connected as d.c. capacitor electrodes while heated in an air atmosphere. The capacitor was positioned in a furnace with controlled temperatures of 500°C and 600°C for 1 h in air with an imposed electrical field of 2.5 x 103 V/cm. The surface structure of the electrodes was examined by X-ray diffraction (XRD), scanning electron microscopy and energy dispersive X-ray analysis. After annealing, XRD showed the presence of Cu, Cu2O and a small quantity of CuO. The O/Cu atomic concentration ratio after annealing at 500°C was 2/3 on the anode and 1/2 on the cathode. The CuO phase was not observed at 500°C, whereas at 600°C the intensity of the CuO XRD lines on the anode was greater than those on the cathode. Areas with approximately equal concentrations of Cu and O were observed at 600°C only on the anode. After annealing at 600°C the grain size on the anode was approximately 2.2 μm, whereas on the cathode the observed grain size was approximately 4 μm.
Original language | English |
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Pages (from-to) | 668-671 |
Number of pages | 4 |
Journal | Surface and Coatings Technology |
Volume | 120-121 |
DOIs | |
State | Published - Nov 1999 |
Keywords
- Copper
- Electric field
- Oxidation
- Surface structure