TY - GEN
T1 - Temperature distribution dependence on refractory anode thickness in a vacuum arc
AU - Beilis, I. I.
AU - Koulik, Y.
AU - Boxman, R. L.
PY - 2010
Y1 - 2010
N2 - The time dependent anode temperature was measured in a hot refractory anode vacuum arc (HRAVA) sustained between a consumed water-cooled cylindrical Cu cathode and nonconsumed cylindrical W anodes with d=5, 10, 15, 20 and 30 mm thickness. Arc currents of I=130, 150, 175 and 200 A were applied for periods up to 210 s and an inter-electrode gap of 10 mm. The anode temperature was measured using high-temperature thermocouples at different points in the anode body. The visual radiation emitted by the plasma plume was recorded with a digital camera. The anode temperature increased with time, reaching a steady state value which slightly increased with arc current. When d was increased from 5 to 30 mm, the time for the anode front surface to reach the steady state increased from 40 to 140 s, while this temperature decreased from 2525 to 2325 K (I=175 A). Thus minimizing d advantageously minimizes the start-up transient when using the radially expanding HRAVA plasma plume for thin film deposition.
AB - The time dependent anode temperature was measured in a hot refractory anode vacuum arc (HRAVA) sustained between a consumed water-cooled cylindrical Cu cathode and nonconsumed cylindrical W anodes with d=5, 10, 15, 20 and 30 mm thickness. Arc currents of I=130, 150, 175 and 200 A were applied for periods up to 210 s and an inter-electrode gap of 10 mm. The anode temperature was measured using high-temperature thermocouples at different points in the anode body. The visual radiation emitted by the plasma plume was recorded with a digital camera. The anode temperature increased with time, reaching a steady state value which slightly increased with arc current. When d was increased from 5 to 30 mm, the time for the anode front surface to reach the steady state increased from 40 to 140 s, while this temperature decreased from 2525 to 2325 K (I=175 A). Thus minimizing d advantageously minimizes the start-up transient when using the radially expanding HRAVA plasma plume for thin film deposition.
UR - http://www.scopus.com/inward/record.url?scp=78650424323&partnerID=8YFLogxK
U2 - 10.1109/DEIV.2010.5625877
DO - 10.1109/DEIV.2010.5625877
M3 - ???researchoutput.researchoutputtypes.contributiontobookanthology.conference???
AN - SCOPUS:78650424323
SN - 9781424483655
T3 - Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
SP - 379
EP - 382
BT - ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings
T2 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010
Y2 - 30 August 2010 through 3 September 2010
ER -