We fabricate sub-micron sized diode and transistor structures (down to 100 nm in diameter) inside CuInSe2 crystals by inducing thermally assisted electromigration of mobile dopants. This is achieved by applying an elec. field via a small area contact to the crystals, using a conducting At. Force Microscope tip. The structures are characterized by nm scale scanning spreading resistance and scanning capacitance measurements to reveal the inhomogeneous doping profiles, that result from the elec. field action. Calculations suggest that the smallest of the structures that we made are very close to the lower size limit of possible p/n/p devices.
|Original language||American English|
|Number of pages||4|
|Journal||Institute of Physics Conference Series|
|State||Published - 1998|
- copper indium selenide diode transistor nanostructure
- doping copper indium selenide nanostructure