STEM Energy-Dispersive X-ray Spectroscopy for Quantitative Compositional Metrology in ULSI Technology

Daniel Fishman, Adham Basha, Amram Azulay, Amit Kohn*

*Corresponding author for this work

Research output: Contribution to journalMeeting Abstractpeer-review

Abstract

For metrology in the semiconductor industry, the application of energy dispersive x-ray spectroscopy (EDS) in a scanning transmission electron microscope (STEM) is often limited to qualitative characterization of devices. Compositional quantification is limited by count statistics of x-ray photons within the allotted measurement time and by the standardless Cliff-Lorimer method. Quantitative metrology here means compositional mapping, at nanometre scale lateral spatial resolution, of microelectronic devices in Ultra Large-Scale Integration (ULSI) technology by an electron probe under non-channelling conditions.
Original languageUndefined/Unknown
Article numberozae044.590
Pages (from-to)1184-1185
Number of pages2
JournalMicroscopy and Microanalysis
Volume30
Issue numberSupplement_1
DOIs
StatePublished - 1 Jul 2024

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