Abstract
For metrology in the semiconductor industry, the application of energy dispersive x-ray spectroscopy (EDS) in a scanning transmission electron microscope (STEM) is often limited to qualitative characterization of devices. Compositional quantification is limited by count statistics of x-ray photons within the allotted measurement time and by the standardless Cliff-Lorimer method. Quantitative metrology here means compositional mapping, at nanometre scale lateral spatial resolution, of microelectronic devices in Ultra Large-Scale Integration (ULSI) technology by an electron probe under non-channelling conditions.
Original language | Undefined/Unknown |
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Article number | ozae044.590 |
Pages (from-to) | 1184-1185 |
Number of pages | 2 |
Journal | Microscopy and Microanalysis |
Volume | 30 |
Issue number | Supplement_1 |
DOIs | |
State | Published - 1 Jul 2024 |