Soft lithography molding of polymer integrated optical devices: Reduction of the background residue

George T. Paloczi; Yanyi Huang; Jacob Scheuer; Amnon Yariv

doi:10.1116/1.1767827

Soft lithography molding of polymer integrated optical devices: Reduction of the background residue

George T. Paloczi^*, Yanyi Huang, Jacob Scheuer, Amnon Yariv

^*Corresponding author for this work

California Institute of Technology

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

The soft-mold replication technique for fabrication of polymer integrated optical devices was discussed. Several effects of the background residue were investigated numerically. In addition, the coupling ratio of a directional coupler and the radiation loss in a waveguide bend were also studied. It was found that the residue reduces through dilution of the core polymer solution.

Original language	English
Pages (from-to)	1764-1769
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	4
DOIs	https://doi.org/10.1116/1.1767827
State	Published - Jul 2004
Externally published	Yes

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title = "Soft lithography molding of polymer integrated optical devices: Reduction of the background residue",

abstract = "The soft-mold replication technique for fabrication of polymer integrated optical devices was discussed. Several effects of the background residue were investigated numerically. In addition, the coupling ratio of a directional coupler and the radiation loss in a waveguide bend were also studied. It was found that the residue reduces through dilution of the core polymer solution.",

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year = "2004",

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AU - Scheuer, Jacob

AU - Yariv, Amnon

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AB - The soft-mold replication technique for fabrication of polymer integrated optical devices was discussed. Several effects of the background residue were investigated numerically. In addition, the coupling ratio of a directional coupler and the radiation loss in a waveguide bend were also studied. It was found that the residue reduces through dilution of the core polymer solution.

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IS - 4

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Soft lithography molding of polymer integrated optical devices: Reduction of the background residue

Abstract

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