TY - JOUR
T1 - Scaling effects in Schottky contacts
AU - Ruzin, A.
N1 - Publisher Copyright:
© 2015 AIP Publishing LLC.
PY - 2015/11/28
Y1 - 2015/11/28
N2 - This article reports on scaling effects in Schottky contacts on various types of semiconductors, including low resistivity, semi-intrinsic, and deep-level compensated. The investigation was performed using a finite element computation and drift-diffusion transport model. In low resistivity semiconductors, the currents scale with contact area as long as thermionic emission process dominates the current transport, with limited impact of velocity saturation effect. In high resistivity semiconductors, the scaling is much more complex due to the considerable impact of minority carrier contribution. In several cases, the currents scale with contact radius, rather than with area, due to corresponding electric field variations. In some compensated materials, the impact of velocity saturation was shown to boost the current, due to carrier accumulation and corresponding space charge variations.
AB - This article reports on scaling effects in Schottky contacts on various types of semiconductors, including low resistivity, semi-intrinsic, and deep-level compensated. The investigation was performed using a finite element computation and drift-diffusion transport model. In low resistivity semiconductors, the currents scale with contact area as long as thermionic emission process dominates the current transport, with limited impact of velocity saturation effect. In high resistivity semiconductors, the scaling is much more complex due to the considerable impact of minority carrier contribution. In several cases, the currents scale with contact radius, rather than with area, due to corresponding electric field variations. In some compensated materials, the impact of velocity saturation was shown to boost the current, due to carrier accumulation and corresponding space charge variations.
UR - http://www.scopus.com/inward/record.url?scp=84948470168&partnerID=8YFLogxK
U2 - 10.1063/1.4935628
DO - 10.1063/1.4935628
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AN - SCOPUS:84948470168
SN - 0021-8979
VL - 118
JO - Journal of Applied Physics
JF - Journal of Applied Physics
IS - 20
M1 - 204502
ER -