Recoil implantation of alpha sources for thickness measurement of thin films

I. Kelson, Y. Levy, E. Redmard

Research output: Contribution to journalArticlepeer-review

Abstract

A sequence of radioactive decays can be used to implant alpha-emitting sources in substrates for thickness measurements of films grown on them. Starting with 22aTh, both direct recoil implantation of 224 Ra and a two-stage recoil implantation of 212Pb were performed. The thickness of germanium layers grown on gallium arsenide was determined by measuring the energy loss of the alpha particles traversing them. The results were found to be consistent with those obtained by other methods. The special advantages of the present procedure are discussed.

Original languageEnglish
Pages (from-to)100-104
Number of pages5
JournalJournal of Physics D: Applied Physics
Volume28
Issue number1
DOIs
StatePublished - 14 Jan 1995

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