Recent developments in vacuum arc deposition

Raymond L. Boxman

doi:10.1109/27.964471

Recent developments in vacuum arc deposition

Raymond L. Boxman^*

^*Corresponding author for this work

School of Electrical Engineering

IEEE

Research output: Contribution to journal › Article › peer-review

44 Scopus citations

Abstract

Vacuum arc deposition (VAD) has become an established industrial art for producing hard, wear-resistant and decorative coatings. Sophisticated coatings, including tertiary compounds and multilayers, are increasingly used. Filtered VAD and hot electrode vacuum arcs are increasingly investigated to obtain high-quality, macroparticle-free films. Improved filtered sources, including large rectangular filters, have been demonstrated. Besides tool coatings, films for metallizing integrated circuits and protecting magnetic media are being developed.

Original language	English
Pages (from-to)	762-767
Number of pages	6
Journal	IEEE Transactions on Plasma Science
Volume	29
Issue number	5 I
DOIs	https://doi.org/10.1109/27.964471
State	Published - Oct 2001

Keywords

Cathodic arc
Coatings
Filtered vacuum arc
Thin films
Vacuum arc

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Recent developments in vacuum arc deposition

Abstract

Keywords

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