Keyphrases
Electric Field (E-field)
100%
Silicon Wafer
100%
High-temperature Processing
100%
Alkali Contamination
100%
Metallic Contamination
66%
High Temperature
33%
Oxides
33%
Secondary Ion Mass Spectrometry
33%
K Content
33%
Na Content
33%
Positive Bias
33%
Na-K
33%
Capacitance-voltage
33%
Wafer
33%
Argon
33%
Thermodynamic Approach
33%
Surface Layer
33%
Oxide Layer
33%
Metal Oxidation
33%
Voltage Phase
33%
Li Content
33%
Annealing Treatment
33%
Alkali Metals
33%
Alkali Ions
33%
Vapor Phase Decomposition
33%
Silicon Wafer Surface
33%
Contamination Indices
33%
Wafer Processing
33%
Total Reflection X-ray Fluorescence
33%
Silicon Oxide Layer
33%
X-ray Fluorescence Technique
33%
Oxidation Treatment
33%
Annealing Ambient
33%
Material Science
Oxide Compound
100%
Silicon Wafer
100%
Silicon
66%
Annealing
33%
Secondary Ion Mass Spectrometry
33%
Capacitance
33%
X-Ray Fluorescence Spectroscopy
33%
Alkali Metal
33%
Surface (Surface Science)
33%
Engineering
Silicon Wafer
100%
Electric Field
100%
Oxide Layer
66%
Similarities
33%
X-Ray Fluorescence
33%
Silicon Oxide
33%
Metal Oxidation
33%
Surface Layer
33%
Chemistry
Electric Field
100%
Silicon
100%
X-Ray Fluorescence Spectroscopy
33%
Secondary Ion Mass Spectroscopy
33%
Argon
33%
Alkali Metal
33%
Silicon Oxide
33%
Earth and Planetary Sciences
Electric Field
100%
X-Ray Fluorescence Spectroscopy
33%
Silicon Oxide
33%
Secondary Ion Mass Spectrometry
33%
Vapor Phase
33%
Alkali Metal
33%