TY - JOUR
T1 - Prospects for electron beam aberration correction using sculpted phase masks
AU - Shiloh, Roy
AU - Remez, Roei
AU - Arie, Ady
N1 - Publisher Copyright:
© 2016 Elsevier B.V..
PY - 2016/4/1
Y1 - 2016/4/1
N2 - Technological advances in fabrication methods allowed the microscopy community to take incremental steps towards perfecting the electron microscope, and magnetic lens design in particular. Still, state of the art aberration-corrected microscopes are yet 20-30 times shy of the theoretical electron diffraction limit. Moreover, these microscopes consume significant physical space and are very expensive. Here, we show how a thin, sculpted membrane is used as a phase-mask to induce specific aberrations into an electron beam probe in a standard high resolution TEM. In particular, we experimentally demonstrate beam splitting, two-fold astigmatism, three-fold astigmatism, and spherical aberration.
AB - Technological advances in fabrication methods allowed the microscopy community to take incremental steps towards perfecting the electron microscope, and magnetic lens design in particular. Still, state of the art aberration-corrected microscopes are yet 20-30 times shy of the theoretical electron diffraction limit. Moreover, these microscopes consume significant physical space and are very expensive. Here, we show how a thin, sculpted membrane is used as a phase-mask to induce specific aberrations into an electron beam probe in a standard high resolution TEM. In particular, we experimentally demonstrate beam splitting, two-fold astigmatism, three-fold astigmatism, and spherical aberration.
KW - Aberration correction
KW - Electron column
KW - Phase-masks
KW - Phase-plates
KW - Thin film membranes
UR - http://www.scopus.com/inward/record.url?scp=84959441418&partnerID=8YFLogxK
U2 - 10.1016/j.ultramic.2016.02.002
DO - 10.1016/j.ultramic.2016.02.002
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C2 - 26939029
AN - SCOPUS:84959441418
VL - 163
SP - 69
EP - 74
JO - Ultramicroscopy
JF - Ultramicroscopy
SN - 0304-3991
ER -