TY - JOUR
T1 - Principles and Applications of Vacuum Arc Coatings
AU - Boxman, Raymond L.
AU - Goldsmith, S.
N1 - Funding Information:
Manuscript received October 26, 1988; revised February 15, 1989. This work was supported by the Israel Academy of Science and Humanities Applied Research in the Universities Fund and by the Foundation for Research in Electronics, Computers. and Communications, administered by the Is- rael Academy of Sciences and Humanities. R. L. Boxman is with the Electrical Discharge and Plasma Laboratory, Tel Aviv University, P.O.B. 39040, Tel Aviv 69978, Israel. He is currently on sabbatical at the Department of Electrical and Computer Engineering, Drexel University, Philadelphia, PA 19104. S. Goldsmith is with the Electrical Discharge and Plasma Laboratory, Tel Aviv University, P.O.B. 39040, Tel Aviv 69978, Israel. IEEE Log Number 8930196.
PY - 1989/10
Y1 - 1989/10
N2 - The development of vacuum arc coatings, commencing a century ago with Thomas Edison and continuing through the recent development of industrial-scale batch coating machines, is reviewed. Most of the work exploited the high ionization, plasma production rate, and ion energy intrinsic in the cathode spot arc to deposit metals, diamond-like carbon, Si, and with the presence of a background gas, various ceramics. Deposition rates of up to 400 μm/s have been achieved in pulsed operation. Various techniques were developed to control the motion and location of the cathode spots and to reduce the macroparticle contamination of the coatings. Hot electrode vacuum arc modes have been investigated recently as well. Simple models for the plasma transport to the substrate based on known properties of the cathode spot plasma jets are presented, as well as a description of current industrial practice.
AB - The development of vacuum arc coatings, commencing a century ago with Thomas Edison and continuing through the recent development of industrial-scale batch coating machines, is reviewed. Most of the work exploited the high ionization, plasma production rate, and ion energy intrinsic in the cathode spot arc to deposit metals, diamond-like carbon, Si, and with the presence of a background gas, various ceramics. Deposition rates of up to 400 μm/s have been achieved in pulsed operation. Various techniques were developed to control the motion and location of the cathode spots and to reduce the macroparticle contamination of the coatings. Hot electrode vacuum arc modes have been investigated recently as well. Simple models for the plasma transport to the substrate based on known properties of the cathode spot plasma jets are presented, as well as a description of current industrial practice.
UR - http://www.scopus.com/inward/record.url?scp=0024751356&partnerID=8YFLogxK
U2 - 10.1109/27.41186
DO - 10.1109/27.41186
M3 - מאמר
AN - SCOPUS:0024751356
VL - 17
SP - 705
EP - 712
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
SN - 0093-3813
IS - 5
ER -