Photoemission efficiency and persistence of (Cs, F) and (Cs, O) activated GaAs(110)

E. Weissman*, Y. Shapira

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

We have recently reported on a novel negative electron affinity (NEA) photoemitter based on GaAs (110) activated by NF3 gas treatment and Cs deposition. We report on the results obtained from this activation and compare the results to (Cs, O) activation by conventional techniques on the same surface. The initial GaAs(110) surface is obtained by air cleaving in situ 600°C heat treatment. The photoemission yields, using near bandgap photons, are similar for both (Cs, O) and (Cs, F), indicating a common mechanism. As soon as Cs supply is terminated, the photoemission efficiency changes in two steps: the first is slow and is attributed to Cs desorption and the second is apparently due to ambient gas adsorption.

Original languageEnglish
Pages (from-to)1006-1008
Number of pages3
JournalVacuum
Volume41
Issue number4-6
DOIs
StatePublished - 1990

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