TY - JOUR
T1 - Patterning of high Tc superconducting thin films by copper-vapour laser
AU - Barkay, Z.
AU - Deutscher, G.
AU - Kagan, Y.
AU - Shapira, Y.
PY - 1998
Y1 - 1998
N2 - The projection microscope, based on a copper-vapour laser (CVL), is a unique system which combines the capabilities of a high magnification optical microscope and the performance of a high quality laser. The system performance with respect to high Tc superconducting (HTSC) device technology was studied using a scanning electron microscope. CVL patterning of YBaCuO films was demonstrated down to less than 2 μm. The thin films could be partially etched in depth just by controlling the laser pulse power density. In addition in HTSC device applications it could remove layers from thin films up to a complete etching.
AB - The projection microscope, based on a copper-vapour laser (CVL), is a unique system which combines the capabilities of a high magnification optical microscope and the performance of a high quality laser. The system performance with respect to high Tc superconducting (HTSC) device technology was studied using a scanning electron microscope. CVL patterning of YBaCuO films was demonstrated down to less than 2 μm. The thin films could be partially etched in depth just by controlling the laser pulse power density. In addition in HTSC device applications it could remove layers from thin films up to a complete etching.
UR - http://www.scopus.com/inward/record.url?scp=0032000793&partnerID=8YFLogxK
U2 - 10.1023/A:1008876431467
DO - 10.1023/A:1008876431467
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AN - SCOPUS:0032000793
SN - 0957-4522
VL - 9
SP - 35
EP - 38
JO - Journal of Materials Science: Materials in Electronics
JF - Journal of Materials Science: Materials in Electronics
IS - 1
ER -