Oxidation and thermal stability of thin film copper layers

Y. Shacham-Diamand*, J. Li, J. O. Olowlafe, S. Russel, Y. Tamou, J. W. Mayer

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

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Keyphrases

Material Science

Engineering