ONO charging at different stages of microFlash® process flow

Michael Lisiansky, Yakov Roizin, Micha Gutman, Shani Keysar, Avi Ben-Guigui, Moshe Berreby

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In-process ultraviolet (UV) stimulated charging of ONO (oxide-nitride- oxide) stack is observed in fieldless 1microFlash (NROM) memory arrays. This problem is solved by introducing a UV blocking layer into the Dl dielectric. In this paper we discuss an alternative approach to the solution of charging problem. A micropartitioning technique is described that allows to screen out the operations responsible for ONO charging and corresponding equipment.

Original languageEnglish
Title of host publication2004 International Conference on Integrated Circuit Design and Technology, ICICDT
Pages231-235
Number of pages5
StatePublished - 2004
Externally publishedYes
Event2004 International Conference on Integrated Circuit Design and Technology, ICICDT - Austin, TX, United States
Duration: 17 May 200420 May 2004

Publication series

Name2004 International Conference on Integrated Circuit Design and Technology, ICICDT

Conference

Conference2004 International Conference on Integrated Circuit Design and Technology, ICICDT
Country/TerritoryUnited States
CityAustin, TX
Period17/05/0420/05/04

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