TY - JOUR
T1 - Negative magnetoresistance in thin copper films
AU - Van Haesendonck, C.
AU - Van den Dries, L.
AU - Bruynsraede, Y.
AU - Deutscher, G.
N1 - Funding Information:
We thank the Belgium I.I.K.W. and the NSF (grant DMR 78-27129) for financial support. We also acknowledge discussions with R. Orbach, O. Entin Wohlman, T. Holstein, and P. Chaikin.
PY - 1981
Y1 - 1981
N2 - We have measured the magnetoresistance of Cu films (50 to 140 Å) in fields up to 4 T. When the field is applied perpendicular to the layers, the magnetoresistance is negative and shows a strong field dependence in low fields (H ≪ 1 T). In a parallel field, the resistance of the samples is essentially field independent up to fields of the order of 1 T. These observations are compared to the predictions of the localization theory by Altshuler et al.
AB - We have measured the magnetoresistance of Cu films (50 to 140 Å) in fields up to 4 T. When the field is applied perpendicular to the layers, the magnetoresistance is negative and shows a strong field dependence in low fields (H ≪ 1 T). In a parallel field, the resistance of the samples is essentially field independent up to fields of the order of 1 T. These observations are compared to the predictions of the localization theory by Altshuler et al.
UR - http://www.scopus.com/inward/record.url?scp=0019601373&partnerID=8YFLogxK
U2 - 10.1016/0378-4363(81)90311-9
DO - 10.1016/0378-4363(81)90311-9
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AN - SCOPUS:0019601373
SN - 0378-4363
VL - 107
SP - 7
EP - 8
JO - Physica B: Physics of Condensed Matter & C: Atomic, Molecular and Plasma Physics, Optics
JF - Physica B: Physics of Condensed Matter & C: Atomic, Molecular and Plasma Physics, Optics
IS - 1-3
ER -