Negative magnetoresistance in thin copper films

C. Van Haesendonck*, L. Van den Dries, Y. Bruynsraede, G. Deutscher

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

We have measured the magnetoresistance of Cu films (50 to 140 Å) in fields up to 4 T. When the field is applied perpendicular to the layers, the magnetoresistance is negative and shows a strong field dependence in low fields (H ≪ 1 T). In a parallel field, the resistance of the samples is essentially field independent up to fields of the order of 1 T. These observations are compared to the predictions of the localization theory by Altshuler et al.

Original languageEnglish
Pages (from-to)7-8
Number of pages2
JournalPhysica B: Physics of Condensed Matter & C: Atomic, Molecular and Plasma Physics, Optics
Volume107
Issue number1-3
DOIs
StatePublished - 1981
Externally publishedYes

Funding

FundersFunder number
National Science FoundationDMR 78-27129

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