Nanolithography toolbox: Device design at the nanoscale

K. C. Balram, D. A. Westly, M. Davanco, K. E. Grutter, Q. Li, T. Michels, C. H. Ray, L. Yu, R. J. Kasica, C. B. Wallin, I. J. Gilbert, Brian A. Bryce, G. Simelgor, J. Topolancik, N. Lobontiu, Y. Liu, P. Neuzil, V. Svatos, K. A. Dill, N. A. BertrandM. Metzler, G. Lopez, D. A. Czaplewski, L. Ocola, K. A. Srinivasan, S. M. Stavis, V. A. Aksyuk, J. A. Liddle, S. Krylov, B. R. Ilic

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2017
PublisherOSA - The Optical Society
ISBN (Print)9781943580279
DOIs
StatePublished - 2017
EventCLEO: Applications and Technology, CLEO_AT 2017 - San Jose, United States
Duration: 14 May 201719 May 2017

Publication series

NameOptics InfoBase Conference Papers
VolumePart F43-CLEO_AT 2017

Conference

ConferenceCLEO: Applications and Technology, CLEO_AT 2017
Country/TerritoryUnited States
CitySan Jose
Period14/05/1719/05/17

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