Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces

Rachel Gabai; Ariel Ismach; Ernesto Joselevich

doi:10.1002/adma.200601625

Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces

Rachel Gabai^*, Ariel Ismach, Ernesto Joselevich

^*Corresponding author for this work

Weizmann Institute of Science

Research output: Contribution to journal › Article › peer-review

46 Scopus citations

Abstract

A study was conducted to investigate a new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces. Miscut C-plane sapphire wafers were annealed in air at 1100°C for 5-10 h, while M-plane sapphire wafers were annealed in air at 1500°C for 20-48 h. Patterned self-assembled monolayers (SAM) and silanes were made on clean native Si(100) and on Si(100) coated with 50 Å adhesion layer of Cr followed by 200 Å of Au. For the production of each elastomeric stamp, the sapphire template was placed on a polystyrene dish, and a degassed mixture of Sylgard 184 silicone elastomer was poured over it. It was observed that nanofacet lithography (NFL) allowed formation of periodic nanostructures on Au and Si/SiO₂ substrate. Result shows that the unstable crystal surfaces can be used as spontaneous NPGSs for nanopatterning and nanofabrication.

Original language	English
Pages (from-to)	1325-1330
Number of pages	6
Journal	Advanced Materials
Volume	19
Issue number	10
DOIs	https://doi.org/10.1002/adma.200601625
State	Published - 21 May 2007
Externally published	Yes

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@article{17853038e0794cedb514549d25dd3dc3,

title = "Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces",

abstract = "A study was conducted to investigate a new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces. Miscut C-plane sapphire wafers were annealed in air at 1100°C for 5-10 h, while M-plane sapphire wafers were annealed in air at 1500°C for 20-48 h. Patterned self-assembled monolayers (SAM) and silanes were made on clean native Si(100) and on Si(100) coated with 50 {\AA} adhesion layer of Cr followed by 200 {\AA} of Au. For the production of each elastomeric stamp, the sapphire template was placed on a polystyrene dish, and a degassed mixture of Sylgard 184 silicone elastomer was poured over it. It was observed that nanofacet lithography (NFL) allowed formation of periodic nanostructures on Au and Si/SiO2 substrate. Result shows that the unstable crystal surfaces can be used as spontaneous NPGSs for nanopatterning and nanofabrication.",

author = "Rachel Gabai and Ariel Ismach and Ernesto Joselevich",

year = "2007",

month = may,

day = "21",

doi = "10.1002/adma.200601625",

language = "אנגלית",

volume = "19",

pages = "1325--1330",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "10",

}

TY - JOUR

T1 - Nanofacet lithography

T2 - A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces

AU - Gabai, Rachel

AU - Ismach, Ariel

AU - Joselevich, Ernesto

PY - 2007/5/21

Y1 - 2007/5/21

N2 - A study was conducted to investigate a new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces. Miscut C-plane sapphire wafers were annealed in air at 1100°C for 5-10 h, while M-plane sapphire wafers were annealed in air at 1500°C for 20-48 h. Patterned self-assembled monolayers (SAM) and silanes were made on clean native Si(100) and on Si(100) coated with 50 Å adhesion layer of Cr followed by 200 Å of Au. For the production of each elastomeric stamp, the sapphire template was placed on a polystyrene dish, and a degassed mixture of Sylgard 184 silicone elastomer was poured over it. It was observed that nanofacet lithography (NFL) allowed formation of periodic nanostructures on Au and Si/SiO2 substrate. Result shows that the unstable crystal surfaces can be used as spontaneous NPGSs for nanopatterning and nanofabrication.

AB - A study was conducted to investigate a new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces. Miscut C-plane sapphire wafers were annealed in air at 1100°C for 5-10 h, while M-plane sapphire wafers were annealed in air at 1500°C for 20-48 h. Patterned self-assembled monolayers (SAM) and silanes were made on clean native Si(100) and on Si(100) coated with 50 Å adhesion layer of Cr followed by 200 Å of Au. For the production of each elastomeric stamp, the sapphire template was placed on a polystyrene dish, and a degassed mixture of Sylgard 184 silicone elastomer was poured over it. It was observed that nanofacet lithography (NFL) allowed formation of periodic nanostructures on Au and Si/SiO2 substrate. Result shows that the unstable crystal surfaces can be used as spontaneous NPGSs for nanopatterning and nanofabrication.

UR - http://www.scopus.com/inward/record.url?scp=34547298907&partnerID=8YFLogxK

U2 - 10.1002/adma.200601625

DO - 10.1002/adma.200601625

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:34547298907

SN - 0935-9648

VL - 19

SP - 1325

EP - 1330

JO - Advanced Materials

JF - Advanced Materials

IS - 10

ER -

Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces

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