A study was conducted to investigate a new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces. Miscut C-plane sapphire wafers were annealed in air at 1100°C for 5-10 h, while M-plane sapphire wafers were annealed in air at 1500°C for 20-48 h. Patterned self-assembled monolayers (SAM) and silanes were made on clean native Si(100) and on Si(100) coated with 50 Å adhesion layer of Cr followed by 200 Å of Au. For the production of each elastomeric stamp, the sapphire template was placed on a polystyrene dish, and a degassed mixture of Sylgard 184 silicone elastomer was poured over it. It was observed that nanofacet lithography (NFL) allowed formation of periodic nanostructures on Au and Si/SiO2 substrate. Result shows that the unstable crystal surfaces can be used as spontaneous NPGSs for nanopatterning and nanofabrication.