Abstract
An attempt is made to shed light on the factors that affect surface morphology of ultrathin heteroepitaxial cobalt-semiconductor compound layers in relation to the kinetics of phase formation in those layers. An explanation is proposed, which relates the layer's surface morphology to the layer-substrate mismatch as a function of a particular sequence of kinetically driven phase-formation processes.
| Original language | English |
|---|---|
| Pages (from-to) | 1419-1426 |
| Number of pages | 8 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 20 |
| Issue number | 4 |
| DOIs | |
| State | Published - Jul 2002 |
| Event | Proceedings of the 29th Conference on the Physics and Chemistry of Semiconductor Interfaces - Santa Fe, NM, United States Duration: 6 Jan 2002 → 10 Jan 2002 |