Molecule-solid interfaces studied with infrared ellipsometry: Ultrathin nitrobenzene films

M. Gensch*, K. Roodenko, K. Hinrichs, R. Hunger, A. G. Güell, A. Merson, U. Schade, Y. Shapira, Th Dittrich, J. Rappich, N. Esser

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

This paper aims to demonstrate the high capability of infrared spectroscopic ellipsometry (IRSE) for the characterization of very thin organic films and the organic to inorganic interfaces. It is shown that the detection limit of IRSE facilitates the investigation of ultrathin nitrobenzene (NB) films with monolayer sensitivity. This accounts for substrates from semiconductors to metals. The process of reoxidation of a NB terminated silicon (001) surface is also reflected in the infrared ellipsometric parameters and evidently proceeds despite the organic layer. As a complementary method, x-ray photoelectron spectroscopy (XPS) measurements were performed.

Original languageEnglish
Pages (from-to)1838-1842
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number4
DOIs
StatePublished - 2005

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