TY - JOUR
T1 - Micro Lasers by Scalable Lithography of Metal-Halide Perovskites
AU - Bar-On, Ofer
AU - Brenner, Philipp
AU - Lemmer, Uli
AU - Scheuer, Jacob
N1 - Publisher Copyright:
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2018/12
Y1 - 2018/12
N2 - A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub-micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by characterizing distributed feedback laser fabricated from these films. It is shown that the material properties are not impaired by the lithographic process. Using this approach, on chip, micro lasers are fabricated. The experimental characterization of these lasers shows that they exhibit low threshold levels and single-mode lasing. As far as it is known, this is the first demonstration of complete, high-resolution lithography of perovskites films exhibiting the smallest perovskite features realized using a top-down lithography technique. This process offers an important tool toward integrated perovskite photonics and is highly applicable also for the fields of photovoltaics, metasurfaces, electronics, and other promising applications.
AB - A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub-micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by characterizing distributed feedback laser fabricated from these films. It is shown that the material properties are not impaired by the lithographic process. Using this approach, on chip, micro lasers are fabricated. The experimental characterization of these lasers shows that they exhibit low threshold levels and single-mode lasing. As far as it is known, this is the first demonstration of complete, high-resolution lithography of perovskites films exhibiting the smallest perovskite features realized using a top-down lithography technique. This process offers an important tool toward integrated perovskite photonics and is highly applicable also for the fields of photovoltaics, metasurfaces, electronics, and other promising applications.
KW - distributed feedback lasers
KW - integrated photonics
KW - metal-halide perovskites
KW - nanoimprint lithography
UR - http://www.scopus.com/inward/record.url?scp=85052887477&partnerID=8YFLogxK
U2 - 10.1002/admt.201800212
DO - 10.1002/admt.201800212
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AN - SCOPUS:85052887477
SN - 2365-709X
VL - 3
JO - Advanced Materials Technologies
JF - Advanced Materials Technologies
IS - 12
M1 - 1800212
ER -