Magnetic control in vacuum arc deposition a review

R. L. Boxman*, I. I. Beilis, E. Gidalevich, V. N. Zhitomirsky

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

The use of magnetic fields to control cathode spot location and motion and to collimate and direct the plasma flow in vacuum arc deposition apparatus is reviewed. Retrograde and acute angle motion are used to control the location and motion of cathode spots, in order to confine them to the cathode surface facing the substrates, to prevent local overheating, and to reduce macroparticle production. Axial fields are use to collimate cathode spot produced plasma jets, and to bend them around macoparticle occluding obstacles in filtered vacuum arc deposition. Advances have been made in understanding these phenomena, but theoretical models have not yet been formulated which can predict plasma behavior sufficiently well for apparatus design.

Original languageEnglish
Title of host publicationProceedings - XXIth International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
Pages473-479
Number of pages7
DOIs
StatePublished - 2004
EventProceedings - XXIth International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV - Yalta, Ukraine
Duration: 27 Sep 20041 Oct 2004

Publication series

NameProceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
Volume2
ISSN (Print)1093-2941

Conference

ConferenceProceedings - XXIth International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
Country/TerritoryUkraine
CityYalta
Period27/09/041/10/04

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