TY - JOUR
T1 - Magnetic control in vacuum arc deposition
T2 - A review
AU - Boxman, Raymond L.
AU - Beilis, Isak I.
AU - Gidalevich, Evgeny
AU - Zhitomirsky, Vladimir N.
PY - 2005/10
Y1 - 2005/10
N2 - The use of magnetic fields to control cathode spot location and' motion and to collimate and direct the plasma flow in vacuum arc deposition apparatus is reviewed. Retrograde and acute angle motion are used to control the location and motion of cathode spots, in order to confine them to the cathode surface facing the substrates, to prevent local overheating, and to reduce macroparticle production. Axial fields are use to collimate cathode spot produced plasma jets and to bend them around macroparticle-occluding obstacles in filtered vacuum arc deposition. Advances have been made in understanding these phenomena, but theoretical models have not yet been formulated which can predict plasma behavior sufficiently well for apparatus design.
AB - The use of magnetic fields to control cathode spot location and' motion and to collimate and direct the plasma flow in vacuum arc deposition apparatus is reviewed. Retrograde and acute angle motion are used to control the location and motion of cathode spots, in order to confine them to the cathode surface facing the substrates, to prevent local overheating, and to reduce macroparticle production. Axial fields are use to collimate cathode spot produced plasma jets and to bend them around macroparticle-occluding obstacles in filtered vacuum arc deposition. Advances have been made in understanding these phenomena, but theoretical models have not yet been formulated which can predict plasma behavior sufficiently well for apparatus design.
KW - Cathode spots
KW - Macroparticle filtering
KW - Magnetic collimation
KW - Magnetic steering
KW - Retrograde motion
KW - Vacuum arc
KW - Vacuum arc deposition
UR - http://www.scopus.com/inward/record.url?scp=27744608484&partnerID=8YFLogxK
U2 - 10.1109/TPS.2005.856532
DO - 10.1109/TPS.2005.856532
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AN - SCOPUS:27744608484
SN - 0093-3813
VL - 33
SP - 1618
EP - 1625
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 5 I
ER -