Low-temperature film thickness measurements by a quartz thickness monitor

P. H. Barrett; M. Pasternak

doi:10.1063/1.324083

Low-temperature film thickness measurements by a quartz thickness monitor

P. H. Barrett^*, M. Pasternak

^*Corresponding author for this work

University of California at Santa Barbara

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

A quartz-crystal thickness monitor was successfully applied at low temperatures (5-80 K) and used to determine the areal density of condensed CH₄, N₂, CO₂, Ar, Kr, and Xe. The frequency-shift dependence on the deposited mass was calibrated using the x-ray absorption technique. The stability, reproducibility, and temperature variation of the resonance frequency in the 5-300 K temperature range are discussed.

Original language	English
Pages (from-to)	3116-3117
Number of pages	2
Journal	Journal of Applied Physics
Volume	48
Issue number	7
DOIs	https://doi.org/10.1063/1.324083
State	Published - 1977
Externally published	Yes

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title = "Low-temperature film thickness measurements by a quartz thickness monitor",

abstract = "A quartz-crystal thickness monitor was successfully applied at low temperatures (5-80 K) and used to determine the areal density of condensed CH4, N2, CO2, Ar, Kr, and Xe. The frequency-shift dependence on the deposited mass was calibrated using the x-ray absorption technique. The stability, reproducibility, and temperature variation of the resonance frequency in the 5-300 K temperature range are discussed.",

author = "Barrett, {P. H.} and M. Pasternak",

year = "1977",

doi = "10.1063/1.324083",

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AU - Pasternak, M.

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N2 - A quartz-crystal thickness monitor was successfully applied at low temperatures (5-80 K) and used to determine the areal density of condensed CH4, N2, CO2, Ar, Kr, and Xe. The frequency-shift dependence on the deposited mass was calibrated using the x-ray absorption technique. The stability, reproducibility, and temperature variation of the resonance frequency in the 5-300 K temperature range are discussed.

AB - A quartz-crystal thickness monitor was successfully applied at low temperatures (5-80 K) and used to determine the areal density of condensed CH4, N2, CO2, Ar, Kr, and Xe. The frequency-shift dependence on the deposited mass was calibrated using the x-ray absorption technique. The stability, reproducibility, and temperature variation of the resonance frequency in the 5-300 K temperature range are discussed.

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Low-temperature film thickness measurements by a quartz thickness monitor

Abstract

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