Low-temperature film thickness measurements by a quartz thickness monitor

P. H. Barrett*, M. Pasternak

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


A quartz-crystal thickness monitor was successfully applied at low temperatures (5-80 K) and used to determine the areal density of condensed CH4, N2, CO2, Ar, Kr, and Xe. The frequency-shift dependence on the deposited mass was calibrated using the x-ray absorption technique. The stability, reproducibility, and temperature variation of the resonance frequency in the 5-300 K temperature range are discussed.

Original languageEnglish
Pages (from-to)3116-3117
Number of pages2
JournalJournal of Applied Physics
Issue number7
StatePublished - 1977
Externally publishedYes


Dive into the research topics of 'Low-temperature film thickness measurements by a quartz thickness monitor'. Together they form a unique fingerprint.

Cite this