Low-loss ridge Ti:LiNbO3 waveguides fabrication

Vadim Dobrusin*, Shlomo Ruschin

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


In this work we discuss a method of smooth waveguide fabrication by wet etching, using a novel mixture of organic and inorganic acids. We fabricated 4.5μm-deep large single mode waveguide with walls and edges roughness comparable with the roughness of non-etched regions. Surface and wall roughness as well as etching rates and propagation losses are presented and compared to characteristics achieved by traditional wet etching recipes. The method was developed as part of the effort to implement fast and widely tunable AWG-based wavelength filter with channel spacing suitable for dense WDM networks.

Original languageEnglish
Article number126
Pages (from-to)793-796
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Issue numberPART 2
StatePublished - 2004
EventPhotonics North 2004: International Conference on Applications of Photonic Technology, ICAPT - Ottawa, Ont., Canada
Duration: 26 Sep 200429 Sep 2004


  • Lithium Niobate
  • Low-loss waveguide
  • Ridge Ti:LiNbO waveguide
  • Wet etching


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