Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

A. C. Livanos, A. Katzir, J. B. Shellan, A. Yariv

Research output: Contribution to journalArticlepeer-review

Abstract

The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 Å ± 5 Å/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.

Original languageEnglish
Pages (from-to)1633-1635
Number of pages3
JournalApplied Optics
Volume16
Issue number6
DOIs
StatePublished - Jun 1977
Externally publishedYes

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