LASER BEAM PHOTOLITHOGRAPHIC SYSTEM FOR INTEGRATED OPTICS APPLICATIONS.

I. Ben-David*, S. Berlowitz, M. Itzkowitz, S. Ruschin, N. Croitoru

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A photolithographic system was operated based on direct laser beam exposure of photoresist films. Lineshape dependence on various fabrication parameters is reported.

Original languageEnglish
Title of host publicationSpringer Series in Optical Sciences
PublisherSpringer Verlag
Pages34-37
Number of pages4
ISBN (Print)0387155376, 9780387155371
DOIs
StatePublished - 1985

Publication series

NameSpringer Series in Optical Sciences
Volume48
ISSN (Print)0342-4111

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