Intrinsic compressive stress in polycrystalline films with negligible grain boundary diffusion

  • Brian W. Sheldon*
  • , Adi Ditkowski
  • , R. Beresford
  • , Eric Chason
  • , Janet Rankin
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

35 Scopus citations

Abstract

Intrinsic compressive stress in polycrystalline films with negligible grain boundary diffusion was investigated. The stresses were attributed to the insertion of excess adatoms at grain boundaries. The strain profiles were determined by the ratio of the atom insertion and growth rates in the absence of grain boundary diffusion.

Original languageEnglish
Pages (from-to)948-957
Number of pages10
JournalJournal of Applied Physics
Volume94
Issue number2
DOIs
StatePublished - 15 Jul 2003
Externally publishedYes

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