Influence of background gas pressure on copper film deposition and ion current in a hot refractory anode vacuum ARC

I. I. Beilis*, A. Shashurin, R. L. Boxman, S. Goldsmith

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Fingerprint

Dive into the research topics of 'Influence of background gas pressure on copper film deposition and ion current in a hot refractory anode vacuum ARC'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science

Chemistry