Indirect tunneling in metal-insulator-metal junctions

V. Fleurov*, M. Karpovski, M. Molotskii, A. Palevski, A. Gladkikh, R. Kris

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

I - V characteristics of realistic MIM junctions were calculated assuming a two step indirect tunneling as the major mechanism. Electron-phonon broadening of the energy level of the intermediate defect states is taken into account. The theory is compared with our experimental investigations of Pd-MgO-Pd junctions and good quantitative agreement is achieved. The intermediate states are provided by the F-centers of the MgO vacancies. A consistency between the experimental data and the theory is obtained for the values of the physical parameters known from independent studies on MgO.

Original languageEnglish
Pages (from-to)543-547
Number of pages5
JournalSolid State Communications
Volume97
Issue number6
DOIs
StatePublished - Feb 1996

Keywords

  • A. heterojunctions
  • C. point defects
  • D. electronic transport
  • D. tunneling

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