In-situ measurement of the strain relaxation of GaN nanograins during X-ray irradiation

Hyeokmin Choe, Sanghwa Lee, Yuri Sohn, Chinkyo Kim*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

GaN nanograins were grown on a c-plane sapphire substrate and their strain relaxation due to x-ray irradiation was investigated in-situ by utilizing synchrotron xray scattering. The GaN nanograins were constantly exposed to the synchrotron X-ray and θ-2θ scans through the (002) Bragg peak of GaN were repeatedly carried out during the irradiation. The Bragg peak of the compressively strained GaN nanograins gradually shifted toward higher angle, which implies that the GaN nanograins in compressive strain experienced strain relaxation during x-ray irradiation.

Original languageEnglish
Pages (from-to)1699-1701
Number of pages3
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Volume5
Issue number6
DOIs
StatePublished - 2008
Externally publishedYes
Event7th International Conference of Nitride Semiconductors, ICNS-7 - Las Vegas, NV, United States
Duration: 16 Sep 200721 Sep 2007

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