Impact of surface treatments on I–V characteristics in Cd1−xZnxTe and Cd1−xMnxTe crystals

Artem Brovko; Arie Ruzin

doi:10.1016/j.nima.2018.10.154

Impact of surface treatments on I–V characteristics in Cd_1−xZn_xTe and Cd_1−xMn_xTe crystals

Artem Brovko, Arie Ruzin^*

^*Corresponding author for this work

School of Electrical Engineering

Research output: Contribution to journal › Review article › peer-review

6 Scopus citations

Abstract

In this work, we focused on studying the impact of different surface treatments for Cd_1−xZn_xTe (CZT) and Cd_1−xMn_xTe (CMT) samples with indium evaporated contacts, specifically: mechanical polishing (MP), mechano-chemical polishing (MCP) and mechanical polishing followed by the chemical etching (MP+Et). We examined 3 samples in each group of Cd_0.85Zn_0.15Te and 3 samples in each group of Cd_0.93Mn_0.07Te. Devices were consecutively characterized by current–voltage dependence (I–V). The measured characteristics revealed that for CMT both surface treatments, including chemical exposure to bromine ethylene glycol in MCP or bromine methanol in etching, resulted in linear I–V characteristic consistent with the bulk resistance. At the same time, chemical treatments of CZT samples dramatically increased their current densities (up to several μA/cm²).

Original language	English
Pages (from-to)	46-47
Number of pages	2
Journal	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume	936
DOIs	https://doi.org/10.1016/j.nima.2018.10.154
State	Published - 21 Aug 2019

Funding

Funders	Funder number
Ministry of Science, Technology and Space	3-12951

Keywords

CdMnTe
CdZnTe
Surface
X-ray detectors

Access to Document

10.1016/j.nima.2018.10.154

Cite this

@article{9f6ef6aceffb4e20a7185417f367cd27,

title = "Impact of surface treatments on I–V characteristics in Cd1−xZnxTe and Cd1−xMnxTe crystals",

abstract = "In this work, we focused on studying the impact of different surface treatments for Cd1−xZnxTe (CZT) and Cd1−xMnxTe (CMT) samples with indium evaporated contacts, specifically: mechanical polishing (MP), mechano-chemical polishing (MCP) and mechanical polishing followed by the chemical etching (MP+Et). We examined 3 samples in each group of Cd0.85Zn0.15Te and 3 samples in each group of Cd0.93Mn0.07Te. Devices were consecutively characterized by current–voltage dependence (I–V). The measured characteristics revealed that for CMT both surface treatments, including chemical exposure to bromine ethylene glycol in MCP or bromine methanol in etching, resulted in linear I–V characteristic consistent with the bulk resistance. At the same time, chemical treatments of CZT samples dramatically increased their current densities (up to several μA/cm2).",

keywords = "CdMnTe, CdZnTe, Surface, X-ray detectors",

author = "Artem Brovko and Arie Ruzin",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2019",

month = aug,

day = "21",

doi = "10.1016/j.nima.2018.10.154",

language = "אנגלית",

volume = "936",

pages = "46--47",

journal = "Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment",

issn = "0168-9002",

publisher = "Elsevier",

}

TY - JOUR

T1 - Impact of surface treatments on I–V characteristics in Cd1−xZnxTe and Cd1−xMnxTe crystals

AU - Brovko, Artem

AU - Ruzin, Arie

PY - 2019/8/21

Y1 - 2019/8/21

N2 - In this work, we focused on studying the impact of different surface treatments for Cd1−xZnxTe (CZT) and Cd1−xMnxTe (CMT) samples with indium evaporated contacts, specifically: mechanical polishing (MP), mechano-chemical polishing (MCP) and mechanical polishing followed by the chemical etching (MP+Et). We examined 3 samples in each group of Cd0.85Zn0.15Te and 3 samples in each group of Cd0.93Mn0.07Te. Devices were consecutively characterized by current–voltage dependence (I–V). The measured characteristics revealed that for CMT both surface treatments, including chemical exposure to bromine ethylene glycol in MCP or bromine methanol in etching, resulted in linear I–V characteristic consistent with the bulk resistance. At the same time, chemical treatments of CZT samples dramatically increased their current densities (up to several μA/cm2).

AB - In this work, we focused on studying the impact of different surface treatments for Cd1−xZnxTe (CZT) and Cd1−xMnxTe (CMT) samples with indium evaporated contacts, specifically: mechanical polishing (MP), mechano-chemical polishing (MCP) and mechanical polishing followed by the chemical etching (MP+Et). We examined 3 samples in each group of Cd0.85Zn0.15Te and 3 samples in each group of Cd0.93Mn0.07Te. Devices were consecutively characterized by current–voltage dependence (I–V). The measured characteristics revealed that for CMT both surface treatments, including chemical exposure to bromine ethylene glycol in MCP or bromine methanol in etching, resulted in linear I–V characteristic consistent with the bulk resistance. At the same time, chemical treatments of CZT samples dramatically increased their current densities (up to several μA/cm2).

KW - CdMnTe

KW - CdZnTe

KW - Surface

KW - X-ray detectors

UR - http://www.scopus.com/inward/record.url?scp=85057004473&partnerID=8YFLogxK

U2 - 10.1016/j.nima.2018.10.154

DO - 10.1016/j.nima.2018.10.154

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.systematicreview???

AN - SCOPUS:85057004473

SN - 0168-9002

VL - 936

SP - 46

EP - 47

JO - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

JF - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

ER -