Abstract
A systematic study of impact ionization in pseudo-morphic high electron mobility transistors (PHEMTs) has been carried out using temperature-dependent electrical measurements as well as modeling for optimizing the power performance of the devices through the best layout parameters. A measurement procedure makes it possible to define a safe transistor operation region is proposed. Impact ionization in the channel is parameterized by specific gate current and voltage values. Temperature-dependent measurements are shown to provide distinction between the impact ionization current and the thermionic field emission current. A methodology for defining an optimum vertical structure and a lateral layout for a given application and operational conditions is developed. Empirical models for optimum lateral layout for a power application were developed based on a statistical "Device Zoo" approach. The results point to an optimal gate-to-drain distance for minimum impact ionization current.
Original language | English |
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Pages (from-to) | 479-485 |
Number of pages | 7 |
Journal | IEEE Transactions on Electron Devices |
Volume | 50 |
Issue number | 2 |
DOIs | |
State | Published - Feb 2003 |
Keywords
- Breakdown
- Empirical models
- Impact ionization
- Pseudomorphic high electron mobility transistors (PHEMT)