@article{731b51c90356473a9c24a3be4dda0168,
title = "Imaging of the anode plasma plume development in a hot refractory anode vacuum arc",
abstract = "The hot refractory anode vacuum arc (HRAVA) is a plasma source where the source of the plasma flux is re-evaporation from the surface of a refractory anode of material originally emitted from the cathode. This plasma is used to deposit metallic films with small macroparticle contamination. Photographs of different stages of the development of the HRAVA are presented, allowing tracing of the details the development and giving characteristic times of the HRAVA development.",
keywords = "Anode heating, Anode temperature, Asymmetric anode, Hot refractory anode, Macroparticle free, Plasma plume, Plasma source, Vacuum arc, Vacuum arc deposition",
author = "Beilis, \{Isak I.\} and A. Shashurin and A. Nemirovsky and Boxman, \{R. L.\} and S. Goldsmith",
note = "Funding Information: Manuscript received June 14, 2004. This work was supported by a grant from the Israel Science Foundation under the Israel Academy of Sciences and Humanities.",
year = "2005",
month = apr,
doi = "10.1109/TPS.2005.845015",
language = "אנגלית",
volume = "33",
pages = "408--409",
journal = "IEEE Transactions on Plasma Science",
issn = "0093-3813",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "2 I",
}