High Quality 3D Photonics using Nano Imprint Lithography of Fast Sol-gel Materials

Ofer Bar-On, Philipp Brenner, Tobias Siegle, Raz Gvishi, Heinz Kalt, Uli Lemmer, Jacob Scheuer*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

A method for the realization of low-loss integrated optical components is proposed and demonstrated. This approach is simple, fast, inexpensive, scalable for mass production, and compatible with both 2D and 3D geometries. The process is based on a novel dual-step soft nano imprint lithography process for producing devices with smooth surfaces, combined with fast sol-gel technology providing highly transparent materials. As a concrete example, this approach is demonstrated on a micro ring resonator made by direct laser writing (DLW) to achieve a quality factor improvement from one hundred thousand to more than 3 million. To the best of our knowledge this also sets a Q-factor record for UV-curable integrated micro-ring resonators. The process supports the integration of many types of materials such as light-emitting, electro-optic, piezo-electric, and can be readily applied to a wide variety of devices such as waveguides, lenses, diffractive elements and more.

Original languageEnglish
Article number7833
JournalScientific Reports
Volume8
Issue number1
DOIs
StatePublished - 1 Dec 2018

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