High-gain lateral hot-electron device

A. Palevski*, C. P. Umbach, M. Heiblum

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

A lateral hot-electron device has been fabricated in a plane of a two-dimensional electron gas. The transfer ratio of the device, α, was studied for different geometrical configurations of the emitter barrier. The maximum transfer ratio was greater than 0.99 at 4.2 K, corresponding to a current gain greater than 100 for devices with base widths of 220 nm. An emission of a single longitudinal optical phonon, by the injected electrons, has been observed.

Original languageEnglish
Pages (from-to)1421-1423
Number of pages3
JournalApplied Physics Letters
Volume55
Issue number14
DOIs
StatePublished - 1989
Externally publishedYes

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