Original language | English |
---|---|
Pages (from-to) | 11-14 |
Number of pages | 4 |
Journal | Vide: Science, Technique et Applications |
Volume | 53 |
Issue number | 283 SUPPL. |
DOIs | |
State | Published - 1997 |
Externally published | Yes |
High aspect ratio quarter-micron electroless copper integrated technology
Y. Shacham-Diamand, S. Y. Lopatin
Research output: Contribution to journal › Article › peer-review