Fermi velocity engineering in graphene by substrate modification

Choongyu Hwang, David A. Siegel, Sung Kwan Mo, William Regan, Ariel Ismach, Yuegang Zhang, Alex Zettl, Alessandra Lanzara*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


The Fermi velocity, v F, is one of the key concepts in the study of a material, as it bears information on a variety of fundamental properties. Upon increasing demand on the device applications, graphene is viewed as a prototypical system for engineering v F. Indeed, several efforts have succeeded in modifying v F by varying charge carrier concentration, n. Here we present a powerful but simple new way to engineer v F while holding n constant. We find that when the environment embedding graphene is modified, the v F of graphene is (i) inversely proportional to its dielectric constant, reaching v F ∼ 2.5×10 6 m/s, the highest value for grapheme on any substrate studied so far and (ii) clearly distinguished from an ordinary Fermi liquid. The method demonstrated here provides a new route toward Fermi velocity engineering in a variety of two-dimensional electron systems including topological insulators.

Original languageEnglish
Article number590
JournalScientific Reports
StatePublished - 2012
Externally publishedYes


FundersFunder number
U.S. Department of EnergyDE-AC02-05CH11231
Office of Science
Basic Energy Sciences
Division of Materials Sciences and Engineering


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