Fabrication of electroless CoWP/NiB diffusion barrier layer on SiO 2 for ULSI Devices

Tetsuya Osaka*, Hitoshi Aramaki, Masahiro Yoshino, Kazuyoshi Ueno, Itsuaki Matsuda, Yosi Shacham-Diamand

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Engineering

Chemical Engineering