Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching

Gil Atar; Orna Ternyak; Doron Greental; David Eger; Galina Chechelnitsky; Noa Mazurski; Shifra Gouta; Yehoudit Elbaz; Ariel Bruner; Bruno Sfez; Shlomo Ruschin

doi:10.1016/j.optmat.2014.10.048

Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching

Gil Atar^*, Orna Ternyak, Doron Greental, David Eger, Galina Chechelnitsky, Noa Mazurski, Shifra Gouta, Yehoudit Elbaz, Ariel Bruner, Bruno Sfez, Shlomo Ruschin

^*Corresponding author for this work

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (∼20 × 20 μm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring ∼1 dB/cm optical propagation loss.

Original language	English
Pages (from-to)	265-271
Number of pages	7
Journal	Optical Materials
Volume	38
DOIs	https://doi.org/10.1016/j.optmat.2014.10.048
State	Published - 1 Dec 2014

Keywords

Al doping
Dry etching
Fused silica
Rare-earth doped silica
Waveguide

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@article{724d05f6c34c4032836103d9a57415e3,

title = "Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching",

abstract = "A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (∼20 × 20 μm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring ∼1 dB/cm optical propagation loss.",

keywords = "Al doping, Dry etching, Fused silica, Rare-earth doped silica, Waveguide",

author = "Gil Atar and Orna Ternyak and Doron Greental and David Eger and Galina Chechelnitsky and Noa Mazurski and Shifra Gouta and Yehoudit Elbaz and Ariel Bruner and Bruno Sfez and Shlomo Ruschin",

year = "2014",

month = dec,

day = "1",

doi = "10.1016/j.optmat.2014.10.048",

language = "אנגלית",

volume = "38",

pages = "265--271",

journal = "Optical Materials",

issn = "0925-3467",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching

AU - Atar, Gil

AU - Ternyak, Orna

AU - Greental, Doron

AU - Eger, David

AU - Chechelnitsky, Galina

AU - Mazurski, Noa

AU - Gouta, Shifra

AU - Elbaz, Yehoudit

AU - Bruner, Ariel

AU - Sfez, Bruno

AU - Ruschin, Shlomo

PY - 2014/12/1

Y1 - 2014/12/1

N2 - A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (∼20 × 20 μm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring ∼1 dB/cm optical propagation loss.

AB - A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (∼20 × 20 μm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring ∼1 dB/cm optical propagation loss.

KW - Al doping

KW - Dry etching

KW - Fused silica

KW - Rare-earth doped silica

KW - Waveguide

UR - http://www.scopus.com/inward/record.url?scp=84915778539&partnerID=8YFLogxK

U2 - 10.1016/j.optmat.2014.10.048

DO - 10.1016/j.optmat.2014.10.048

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:84915778539

SN - 0925-3467

VL - 38

SP - 265

EP - 271

JO - Optical Materials

JF - Optical Materials

ER -

Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching

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Keywords

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