Fabrication and characterization of large-core Yb/Al-codoped fused silica waveguides using dry etching

Gil Atar, Orna Ternyak, Doron Greental, David Eger, Galina Chechelnitsky, Noa Mazurski, Shifra Gouta, Yehoudit Elbaz, Ariel Bruner, Bruno Sfez, Shlomo Ruschin

Research output: Contribution to journalArticlepeer-review

Abstract

A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica matrix and Al doping are generally etched using different chemistries. First large-core (∼20 × 20 μm) Yb/Al-codoped fused silica waveguides on pure silica substrate were successfully fabricated, featuring ∼1 dB/cm optical propagation loss.

Original languageEnglish
Pages (from-to)265-271
Number of pages7
JournalOptical Materials
Volume38
DOIs
StatePublished - 1 Dec 2014

Keywords

  • Al doping
  • Dry etching
  • Fused silica
  • Rare-earth doped silica
  • Waveguide

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